Research Assistants

Research Assistants

Nikolaos Koutroumanis

Nikolaos Koutroumanis, is a Ph.D. student in department of Chemical Engineering at University of Patras. He received his BSc and his MSc from the Department of Materials Science of the University of Patras in 2012 and 2014, respectively. His MSc thesis was about “Characterization of high-strength carbon fiber”.

Christos Pavlou

Christos Pavlou, acquired his BSc in Material Science in 2010 from the Department of Material Science, at the University of Patras, his thesis was on ‘investigation of micromachining operations and tool wear’ at the LMS laboratory, in the Department of Mechanical Engineering and Aeronautics, at the University of Patras. Moreover his was a faculty member at the LMS laboratory, as an external collaborator, from the 2005 to 2010, where he participated in various projects.

George Paterakis

George Paterakis is a Doctoral Student at the Department of Chemical Engineering (Univ. of Patras) working with CVD graphene stress-strain tests, supervised by Professor Costas Galiotis. Furthermore he is a member of the Composites & Nanostructured Materials Laboratory (CNM) and at the Institute of Chemical Engineering Sciences (FORTH/ICE-HT), since 2013. He received his university degree in the Department of Materials Science (Univ. of Patras) in 2012 and his MSc degree from the Interdepartmental of Polymer Science & Technology (Univ. of Patras) on the “Photovoltaic cells and devices using polymeric materials and graphene layers” in 2015. He has authored 3 scientific papers on international journals and has actively participated in 10 conferences.

Niki Sotiriou

Niki Sotiriou received her BSc in Physics from the University of Patras and is currently a Postgraduate student in the Department of Chemical Engineering, of the University of Patras.Her research interests are in the fields of plasma processing for the deposition of thin-films and surface treatment. Her current research activities are focused on the synthesis of graphene by PECVD (Plasma Enhanced Chemical Vapor Deposition).